▍Product Profile

EWIN-TECH SCP-6LD Benchtop Spin Coater features an advanced split-structure design tailored for high-precision coating applications. It is capable of uniformly coating liquid or colloidal materials onto various substrate surfaces, including silicon wafers, crystals, quartz, and ceramics. The equipment supports both basic spin-coating and multi-step programmable spin-coating, accommodating substrate sizes from Ø10mm to 150mm. Equipped with a 7-inch touchscreen and an advanced PLC control system, the interface is intuitive and easy to understand, supporting precise experimental parameter settings and real-time operation status display. The internal chamber is designed to be directly detachable for convenient cleaning, adapting to various coating requirements and ensuring simple, efficient operation.

▍Technical Features

1. Wide Applicability: Supports Ø10~150mm substrate coating, suitable for photoresist spin-coating, biological culture media preparation, and many other fields.

2. Precision Control: Spin speed ranges from 100 to 10,000 rpm with 1 rpm resolution, ensuring uniform and precise coating layers.

3. Flexible Programming: Supports both single-step rapid spin-coating and multi-step programmable spin-coating, with settings for multiple groups of coating process parameters.

4. Easy Cleaning and Maintenance: Detachable internal chamber available in materials such as PP, PMMA, or PTFE, providing convenient cleaning to meet different needs.

5. High Stability: The PLC control system provides precise regulation; includes motor glue-ingress protection to prevent damage and a piping design that is easy to clear.

6. Convenient Operation: 7-inch touchscreen with a concise interface displays status and parameters in real-time, making operation intuitive and convenient.

7. Stable and Reliable Design: Equipped with various vacuum chucks (10mm, 25mm, 50mm, 100mm) and an oil-free vacuum pump to ensure stable operation.

▍Technical Parameters

▍Typical Applications

The SCP-6LD Benchtop Spin Coater is widely used in semiconductor, optoelectronics, biomedicine, and other fields. It is suitable for photoresist spin-coating, biological culture media preparation, sol-gel polymer thin-film coating, and various material research. It meets the requirements for high-precision, uniform coating on multi-size substrates in scientific research and small-batch production.