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The EWIN-TECH SCP-4LD is a compact benchtop spin coater designed for high-precision coating. It features a corrosion-resistant PP chamber, an industrial DC motor, and a PLC control system for stable performance. It supports wafers from Ø5mm to 100mm and offers both single-step and multi-step programming. The anti-splash chamber design keeps the process clean and efficient, making it ideal for use in labs or gloveboxes.
Compact Design: Small footprint, perfect for glovebox use to save lab space.
High Precision: Speed range of 100–10,000 rpm with 1 rpm resolution for uniform coating.
High Stability: PLC-controlled programming for reliable multi-step processes.
Easy to Clean: Detachable PP chamber with a concave anti-splash design to keep the workspace clean.
Flexible Programming: Supports 10 programs with 5 steps each to meet various needs.
Real-time Display: 4.3-inch color touchscreen for easy monitoring and parameter settings.
Safety Protection: Motor protection prevents damage from glue ingress.
| Item | Specification |
| Model | SCP-4LD (Φ5~100mm) |
| Applicable Wafer Size Range | Φ5~100mm |
| Spin Coating Speed | 100~10000rpm |
| Speed Resolution | 1rpm |
| Spin Coating Acceleration | 100-10000rpm/s |
| Maximum Spin Coating Time | 3000s |
| Spin Coating Time Accuracy | 0.1s |
| Coating Uniformity | ≤±3% |
| Inner Chamber | 150mm in diameter, with unique concave splash-proof design |
| Programming Function | Equipped with single-step fast spin coating and multi-step programmed spin coating; 10 program groups can be programmed, 5 steps per group |
| Power Input | AC200-230 |
| Product Dimensions | 290mm×235mm×185mm |
The SCP-4LD is widely used in semiconductor, microelectronics, and optoelectronics labs. It provides high-precision coating for photoresists, inks, and other materials on substrates from Ø5mm to 100mm, ensuring consistent results for R&D and small-batch production.
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