▍Product Profile

The EWIN-TECH SCP-8LD is a benchtop spin coater designed for coating semiconductor substrates like silicon wafers. It precisely applies photoresist, photosensitive coatings, or inks, ensuring high quality during the coating and subsequent drying processes. Featuring a 7-inch touchscreen and an imported motor, the system offers stable performance with high chuck flatness and coating uniformity. Its robust design significantly reduces coating errors and wafer fly-off risks, while the vacuum negative pressure display and low-vacuum alarm ensure process stability.

▍Technical Features

1. High-Precision Control: Precision-ground chuck flatness ensures uniformity ≤1%; spin time is adjustable from 1–3,000s with PLC-controlled acceleration for stable, fly-off-free processing.

2. Intelligent Safety Design: Imported motor operates with near-zero vibration; isolated electrical modules prevent liquid leakage; includes vacuum pressure display and low-pressure alarm for safety.

3. Efficient Operation: HMI integrated with PLC allows touchscreen editing of 50 recipes with password protection; equipped with a photoresist filter and waste tank for easy maintenance.

▍Technical Parameters

▍Typical Applications

This system empowers the semiconductor, microelectronics, and optoelectronics sectors. it is specially adapted for silicon wafer photoresist coating and photosensitive material processing, meeting high-precision requirements for laboratory R&D and small-batch production.